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Catalysts based on Fenton reaction for SiC wafer in chemical magnetorheological finishing

Guangdong University of Technology, Guangzhou 510006, China

Special Issues: 14th China-Japan International Conference on Ultra-Precision Machining Process (CJUMP2018)

Aiming at the chemical magnetorheological finishing (CMRF) of single crystal silicon carbide (SiC) based on the Fenton reaction, concentration of hydroxyl radical produced in Fenton reaction and its influence on chemical reaction rate of SiC were detected by visible spectrophotometry, and catalytic ability of different particles was detected by the method of immersion corrosion test. The experimental results showed that surface roughness is better when the carbonyl iron powder (CIP) is used as catalyst. The lower value of pH, the higher content of hydroxyl radicals. The hydroxyl radical can react with SiC surface to form a softer SiO2 oxide layer. The acid environment can promote Fenton reaction and the polishing effect is better, while the oxidation layer of SiC surface is converted to silicate in the alkaline environmental. The SiC after CMRF can obtain the smooth surface of the surface roughness Ra 0.0817 nm when the pH value is 9.
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Keywords chemical magnetorheological finishing; Fenton reaction; silicon carbide (SiC); catalyst

Citation: Huazhuo Liang, Jiabin Lu, Qiusheng Yan. Catalysts based on Fenton reaction for SiC wafer in chemical magnetorheological finishing. AIMS Materials Science, 2018, 5(6): 1112-1123. doi: 10.3934/matersci.2018.6.1112


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